Researchers in the US have created a new nanoscale lithography technique which could make it easier to create electronic components in the future.
Experts at Northwestern University in Chicago, led by Chad Mirkin, have devised a new technology called beam pen lithography BPL which allows nanometre-sized features to be quickly created over large surface areas.
This overcomes the efficiency problems traditionally associated with near-field scanning optical microscopy-based NSOM-based lithography, which could open the door for easier production of nanoscale components for integrated circuits and optoelectronics.
Mr Mirkin told physicsworld.com that BPL could be used to create a desktop printer for nanofabrication, meaning that high-resolution prototype electronic components could be created directly in a lab without needing to involve a third party.
He added: NSOM has always been an attractive tool for doing light-based nanolithography but no-one had come up with a functional way of scaling it up until now.
Last month, Intel created the worlds first end-to-end silicon photonics connection, a breakthrough which it expects will lead to the creation of faster and more efficient electronic components for computers.
